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2003

22 (SCIE) Hanseung Lee, Dukryel Kwon, Hyunah Park, Hyoun Woo Kim, Chongmu Lee*, Jaegab Lee, Rapid Thermal Annealing Treatment of Electroplated Cu Films, Journal of the Korean Physical Society 43 (2003.11.15) 841-846.
21 (SCIE) Hyoun Woo Kim*, Nam Ho Kim, Structural studies of room-temperature RF magnetron sputtered ZnO films under different RF powered conditions, Materials Science and Engineering: B 103 (2003.10.25) 297-302.
20 (SCIE) Hyoun Woo Kim*, Temperature Effect on Tungsten Etching using a Cl2/O2 Helicon Discharge, Journal of the Korean Physical Society 43 (2003.10.15) 526-528.
19 (SCIE) Byong-Sun Ju, Hyoun Woo Kim*, A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method, Microelectronic Engineering 70 (2003.10) 30-34.
18 (SCIE) Hyoun Woo Kim*, Two-way shape memory effect of Cu-Zn-Al alloys induced by a constrained heating method, Journal of Materials Science Letters 22 (2003.09) 1233-1235.
17 (SCIE) K. S. Kim, H. W. Kim*, N. H. Kim, Growth of ZnO thin film on SiO2 substrates by the RF magnetron sputtering method, Journal of Materials Science Letters 22 (2003.08) 1155-1156.
16 (SCIE) Hyoun Woo Kim*, Kwang Sik Kim, Chongmu Lee, Low temperature growth of ZnO thin film on Si(100) substrates by metal organic chemical vapor deposition, Journal of Materials Science Letters 22 (2003.08) 1117-1118.
15 (SCIE) H. W. Kim*, W. S. Hwang, C. Lee, R. Reif, Plasma cleaning of carbon species for silicon homoepitaxial growth, Journal of Materials Science Letters 22 (2003.08) 1067-1068.
14 (SCIE) Hyoun Woo Kim*, Chang-Jin Kang, Investigation into patterning of a stack-type Ru electrode capacitor, Microelectronic Engineering 69 (2003.08) 89-96.
13 (SCIE) Hyoun Woo Kim*, Chang-Jin Kang, Reactive ion etching of Pt electrode using O2-based plasma, Vacuum 71 (2003.07.25) 491-496.