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22 |
(SCIE)Hanseung Lee, Dukryel Kwon, Hyunah Park, Hyoun Woo Kim, Chongmu Lee*, Jaegab Lee, Rapid Thermal Annealing Treatment of Electroplated Cu Films, Journal of the Korean Physical Society 43 (2003.11) 841-846. |
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21 |
(SCIE)Hyoun Woo Kim*, Temperature effect on Tungsten Etching Using a Cl2/O2 Helicon Discharge, Journal of The Korean Physical Society 43 (2003.10) 526-528. |
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20 |
(SCIE)Byong-Sun Ju, Hyoun Woo Kim*, A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method, Microelectronic Engineering 70 (2003.10) 30-34. |
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19 |
(SCIE)Hyoun Woo Kim*, Nam Ho Kim, Structural studies of room-temperature RF magnetron sputtered ZnO films under different RF powered conditions, Materials science and engineering B 103 (2003.10.25) 297-302. |
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18 |
(SCIE)Hyoun Woo Kim*, Two-way shape memory effect of Cu-Zn-Al alloys induced by a constrained heating method, Journal of Materials Science Letters 22 (2003.09) 1233-1235. |
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17 |
(SCIE)K. S. Kim, H. W. Kim*, N. H. Kim, Growth of ZnO thin film on SiO2 substrates by the RF magnetron sputtering method, Journal of Materials Science Letters 22 (2003.08) 1155-1156. |
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16 |
(SCIE)H. W. Kim*, K. S. KIM, C. LEE, Low temperature growth of ZnO thin film on Si (100) substrates by metal organic chemical vapor deposition, Journal of Materials Science Letters 22 (2003.09) 1117-1118. |
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15 |
(SCIE)H. W. Kim*, W. S. Hwang, C. Lee, R. Reif, Plasma cleaning of carbon species for silicon homoepitaxial growth, Journal of Materials Science Letters 22 (2003.09) 1067-1068. |
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14 |
(SCIE)H. W. Kim*, W. S. Hwang, C. Lee, R. Reif, Low temperature growth of homoepitaxial film on Si substrate cleaned in-situ by ECR hydrogen plasma, Journal of Materials Science Letters 22 (2003.07) 939-940. |
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13 |
(SCIE)Hyoun Woo Kim*, Chang-Jin Kang, Investigation of patterning of a stack-type Ru electrode capacitor, Microelectronic Engineering 69 (2003.08) 89-96 |
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