Gas
Sensors
Laboratory

Papers

HOME > Publications > Papers

2003

12 (SCIE)Hyoun Woo Kim*, Chang-Jin Kang, Reactive ion etching of Pt electrode using O2-based plasma, Vacuum 71 (2003.07.25) 491-496.
11 (SCIE)Hyoun Woo Kim*, Byong-Sun Ju, Chang-Jin Kang, Patterning of Ru electrode in O2/Cl2 gas using reactive ion etcher, Vacuum 71 (2003.07.25) 481-486.
10 (SCIE)Kwang Sik Kim, Hyoun Woo Kim*, Nam Ho kim, Structural characterization of ZnO films grown on SiO2 by the RF magnetron sputtering, Physica B 334 (2003.07) 343-346.
0 9 (SCIE)Hyoun Woo Kim*, Chang-Jin Kang, Effect of Ti-mask addition and temperature elevation on O2/Cl2 plasma etching of Pt, Journal of the Korean Physical Society 42 (2003.05) 667-670.
0 8 (SCIE)Hyoun Woo Kim*, Byong-Sun Ju, Chang-Jin Kang, Investigation into the patterning of a concave-type Pt electrode capacitor using the reactive ion etching method, Microelectronic Engineering 65 (2003.05) 489-497.
0 7 (SCIE)Kwang-Sik Kim, Hyoun Woo Kim*, Chomg Mu Lee, Effect of growth temperature on ZnO thin film deposited on SiO2 substrate, Materials Science and Engineering B 98 (2003.03.15) 135-139.
0 6 (SCIE)Kwang-Sik Kim, Hyoun Woo Kim*, Synthesis of ZnO nanorod on bare Si substrate using metal organic chemical vapor deposition, Physica B 328 (2003.05) 368-371.
0 5 (SCIE)Hyoun Woo Kim*, Byong-Sun Ju, Chang-Jin Kang, High-rate Ru electrode etching using O2/Cl2 inductively coupled plasma, Microelectronic engineering 65 (2003.03) 319-326.
0 4 (SCIE)J. H. Lee, W. J. Choi*, Y. J. Park, I. K. Han, J. I. Lee, J. W. Cho, E. K. Kim, C. M. Lee, H.-W. Kim, Thermal treatment of InGaAs/GaAs self-assembled quantum dots with SiNx and SiO2 capping layers, J. Korean Phys. Soc. 42 (2003.02) S313-S315.
0 3 (SCIE)Kwang-Sik Kim, Hyoun Woo Kim*, Structural characterization of ZnO thin film grown on Si-based substrates by metal organic chemical vapor deposition, J. Korean Phys. Soc. 42 (2003.02) S149-S152.