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10 Cheol Jin Lee*, Seung Chul Lyu, Hyoun-Woo Kim, Jin Ho Lee and Kyoung Ik Cho, Synthesis of bamboo-shaped carbon¯nitrogen nanotubes using C2H2¯NH3¯Fe(CO)5 system, Chem. Phys. Lett. 359 (2002.06.13) 115-1120.
0 9 Cheol Jin Lee*, Seung Chul Lyu, Hyoun-Woo Kim, Chong-Yun Park, Cheol-Woong Yang, Large-scale production of aligned carbon nanotubes by the vapor phase growth method, Chem. Phys. Lett. 359 (2002.06.13) 109-114.
0 8 H.W. Kim*, Byong-Sun Ju, Byeong-Yun Nam, Won-Jong Yoo, Chang-Jin Kang, Tae-Hyuk Ahn, Joo-Tae Moon, Moon-Yong Lee, High temperature platinum etching using Ti mask layer, J.Vac. Sci. Tech. A17 (1999.7/8) 2151-2155.
0 7 Hyoun-woo Kim*, Rafael Reif, Ex-situ wafer surface cleaning by HF dipping for low temperature silicon epitaxy, Thin Solid Films 305 (1997.08) 280-285.
0 6 Hyoun-woo Kim*, Zhen-Hong Zhou, Rafael Reif, Room temperature wafer surface cleaning by in-situ ECR hydrogen plasma for silicon homoepitaxial growth, Thin Solid Films 302 (1997.06.20) 169-178.
0 5 Hyoun-woo Kim*, Rafael Reif, In-situ low temperature(600oC) wafer surface cleaning by electron cyclotron resonance hydrogen plasma for silicon homoepitaxial growth, Thin Solid Films 289 (1996.11.30) 192-198.
0 4 Won Jong Yoo*, Jin Hwan Hahm, Hyoun-woo Kim, Chan Ouk Jung, Young Bum Koh, Moon Yong Lee, Control of Etch slope during etching of Pt in Ar/CI2/O2 plasma, Jpn.J.Appl.Phys. 35, (1996.04.30) 2501-2504.
0 3 Z.H.Zhou*, I.Yang, H.Kim, F.Yu, Rafael Reif, Real time in situ epitaxial film thicknessminitoring and control using an emission Fourier transform infrared spectrometer, J.Vac.Sci.Tech.A 12 (1994.7/8) 1938-1942.
0 2 Noboru Nakano*, Louis Marville, Syun-Ming Jang. Kenneth Liao. Cutis Tsai. Julie Tsai,Hyoun-woo Kim, Rafael Reif, Effect of thermal annealing on the Raman spectrum of SiGe grown on Si, J. Appl. Phys. 73 (1993.01.01) 414-417.
0 1 Syun-Ming Jang*, Hyoun-woo Kim, Rafael Reif. Thermal stability ofSi/SiGe/Si heterostructures deposited by very low pressure chemical vapor deposition, Appl. Phys. Lett. 61 (1992.07.20) 315-317.