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34 (SCIE)Hyoun Woo Kim*, Two-way shape memory effect of Cu-Zn-Al alloys induced by a constrained heating method, Journal of Materials Science Letters 22 (2003.09) 1233-1235.
33 (SCIE)K. S. Kim, H. W. Kim*, N. H. Kim, Growth of ZnO thin film on SiO2 substrates by the RF magnetron sputtering method, Journal of Materials Science Letters 22 (2003.08) 1155-1156.
32 (SCIE)H. W. Kim*, K. S. KIM, C. LEE, Low temperature growth of ZnO thin film on Si (100) substrates by metal organic chemical vapor deposition, Journal of Materials Science Letters 22 (2003.09) 1117-1118.
31 (SCIE)H. W. Kim*, W. S. Hwang, C. Lee, R. Reif, Plasma cleaning of carbon species for silicon homoepitaxial growth, Journal of Materials Science Letters 22 (2003.09) 1067-1068.
30 (SCIE)H. W. Kim*, W. S. Hwang, C. Lee, R. Reif, Low temperature growth of homoepitaxial film on Si substrate cleaned in-situ by ECR hydrogen plasma, Journal of Materials Science Letters 22 (2003.07) 939-940.
29 (SCIE)Hyoun Woo Kim*, Chang-Jin Kang, Investigation of patterning of a stack-type Ru electrode capacitor, Microelectronic Engineering 69 (2003.08) 89-96
28 (SCIE)Hyoun Woo Kim*, Chang-Jin Kang, Reactive ion etching of Pt electrode using O2-based plasma, Vacuum 71 (2003.07.25) 491-496.
27 (SCIE)Hyoun Woo Kim*, Byong-Sun Ju, Chang-Jin Kang, Patterning of Ru electrode in O2/Cl2 gas using reactive ion etcher, Vacuum 71 (2003.07.25) 481-486.
26 (SCIE)Kwang Sik Kim, Hyoun Woo Kim*, Nam Ho kim, Structural characterization of ZnO films grown on SiO2 by the RF magnetron sputtering, Physica B 334 (2003.07) 343-346.
25 (SCIE)Hyoun Woo Kim*, Chang-Jin Kang, Effect of Ti-mask addition and temperature elevation on O2/Cl2 plasma etching of Pt, Journal of the Korean Physical Society 42 (2003.05) 667-670.