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34 |
(SCIE) Hanseung Lee, Dukryel Kwon, Hyunah Park, Hyoun Woo Kim, Chongmu Lee*, Jaegab Lee, Rapid Thermal Annealing Treatment of Electroplated Cu Films, Journal of the Korean Physical Society 43 (2003.11.15) 841-846. |
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33 |
(SCIE) Hyoun Woo Kim*, Nam Ho Kim, Structural studies of room-temperature RF magnetron sputtered ZnO films under different RF powered conditions, Materials Science and Engineering: B 103 (2003.10.25) 297-302. |
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32 |
(SCIE) Hyoun Woo Kim*, Temperature Effect on Tungsten Etching using a Cl2/O2 Helicon Discharge, Journal of the Korean Physical Society 43 (2003.10.15) 526-528. |
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31 |
(SCIE) Byong-Sun Ju, Hyoun Woo Kim*, A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method, Microelectronic Engineering 70 (2003.10) 30-34. |
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30 |
(SCIE) Hyoun Woo Kim*, Two-way shape memory effect of Cu-Zn-Al alloys induced by a constrained heating method, Journal of Materials Science Letters 22 (2003.09) 1233-1235. |
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29 |
(SCIE) K. S. Kim, H. W. Kim*, N. H. Kim, Growth of ZnO thin film on SiO2 substrates by the RF magnetron sputtering method, Journal of Materials Science Letters 22 (2003.08) 1155-1156. |
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28 |
(SCIE) Hyoun Woo Kim*, Kwang Sik Kim, Chongmu Lee, Low temperature growth of ZnO thin film on Si(100) substrates by metal organic chemical vapor deposition, Journal of Materials Science Letters 22 (2003.08) 1117-1118. |
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27 |
(SCIE) H. W. Kim*, W. S. Hwang, C. Lee, R. Reif, Plasma cleaning of carbon species for silicon homoepitaxial growth, Journal of Materials Science Letters 22 (2003.08) 1067-1068. |
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26 |
(SCIE) Hyoun Woo Kim*, Chang-Jin Kang, Investigation into patterning of a stack-type Ru electrode capacitor, Microelectronic Engineering 69 (2003.08) 89-96. |
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25 |
(SCIE) Hyoun Woo Kim*, Chang-Jin Kang, Reactive ion etching of Pt electrode using O2-based plasma, Vacuum 71 (2003.07.25) 491-496. |
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